Leader of Advanced Lithography Solutions

2 weeks ago

Dholera, India beBeeOpticalProximityCorrection Full time ₹ 1,20,00,000 - ₹ 2,03,00,000
Job Title

We are seeking an experienced and skilled leader to head our Optical Proximity Correction team in the 300mm wafer fab located in Dholera, India.

  • Lead a high-performing OPC team and set direction for the development of optical proximity correction models for multiple technology nodes.
  • Recruit, train, and enable team members to work on OPC model development, coach, and mentor them to develop high-performance and customer-oriented culture.
  • Work with Technology Transfer partners to understand and transfer OPC methodology to Dholera fab.
  • Develop OPC roadmaps and collaborate with cross-functional teams like Technology Development, Design Enablement, and Lithography/Etch teams.
  • Assist Business teams in performance targets and cost analysis.

Key Responsibilities:

  • Meeting project performance requirements.
  • Competitor benchmarking and roadmap development.
  • Presentation to internal and customer senior executives.
  • Travel as necessary.

Essential Attributes:

  • Ability to work with cross-functional teams.
  • Able to lead the OPC team, set direction, possess leadership traits.
  • Self-motivated with a strong drive to win.
  • Team player with the ability to work across diverse cross-functional teams spread across the world.
  • Inclusive, adapting your style to the situation and diverse global norms of our people.
  • An avid learner, approach challenges with curiosity and resilience, seeking data to help build understanding.
  • Collaborative, building relationships, humbly offering support and openly welcoming approaches.
  • Innovative and creative, proactively explore new ideas and adapt quickly to change.

Qualifications:

  • B.S. in Electrical Engineering, Engineering Physics, Materials Science or equivalent; Masters & PhD holders preferred.
  • Previously developed/led OPC teams on multiple technology nodes is preferred.
  • Strong understanding of Semiconductor process, Customer design elements, Lithography process are required.
  • Collaborative and Cross functional working with internal and external customers.
  • Work seamlessly with Technology Development team, Design Enablement team, Lithography/Etch teams and develop Computational OPC solutions.
  • Knowledge of optical effects (Refraction, diffraction, flare, AR etc.,) required. Litho/etch CD, overlay data collection and analyze for model-based OPC solutions.
  • Knowledge of design enablement and tape-out systems and how OPC is part of the tape-out process.
  • Familiarity with OPC modelling and rule setting processes.
  • Innovation mindset.

Desired Experience Level:

  • > 10 years experience in the Optical Proximity Correction area (OPC) area.
  • Knowledge of Lithography process, tools and patterning aspects. End-to-end knowledge of OPC modelling and application aspects.
  • Successful application of developed OPC models in Production environment & resolved yield limiting factors.
  • Knowledge of CAD tools on OPC modelling and concepts.
  • Knowledge of Design of Experiments, Data Analytics, JMP, Anova and statistical analysis.

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